The ICN´s Nanofabrication facility applies cutting-edge lithography techniques and materials offers the opportunity for process development or prototyping of novel nanostructures and devices with the aim of transferring research output to commercial foundries.
Services offered include:
- Novel nanopatterning methods.
- Flexible processing.
- Thermal and UV light assisted nanoimprint lithography (NIL),
- Electron beam lithography,
- Focused Ion beam lithography,
- Opal growth set up-self assembly kit,
- E-beam evaporation,
- Magnetic E-beam Evaporation,
- Microwave plasma treatment.









